For ordinary surface activation or fine cleaning to increase the wettability of a surface, the diffuse mode of operation is suitable, in which the plasma interacts with the substrate surface without any further measures. If one wants to remove an organic layer on the substrate, a so-called cathodic cleaning by means of a transferred arc is suitable. By grounding the substrate, the nozzle no longer acts as the cathode, but the substrate itself. Due to the greatly increased intensity of the treatment, thin layers of paint, for example, can be removed.